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US Patent Issued to Tokyo Electron on April 7 for "Temperature controlling method and substrate processing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,598,959, issued on April 7, was assigned to Tokyo Electron Ltd. (Tokyo). "Temperature controlling method and substrate processing apparatus" wa... Read More


US Patent Issued to MIANYANG HKC OPTOELECTRONICS TECHNOLOGY, HKC on April 7 for "Display panel, preparation method for display panel, and display device" (Chinese Inventors)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,598,960, issued on April 7, was assigned to MIANYANG HKC OPTOELECTRONICS TECHNOLOGY Co. LTD. (Mianyang, China) and HKC CORPORATION LIMITED (Shen... Read More


US Patent Issued to SAMSUNG ELECTRONICS on April 7 for "Semiconductor package including test pattern and method of fabricating the same" (South Korean Inventor)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,598,961, issued on April 7, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea). "Semiconductor package including test pattern... Read More


US Patent Issued to ADEIA SEMICONDUCTOR BONDING TECHNOLOGIES on April 7 for "System and method for bonding transparent conductor substrates" (California, North Carolina Inventors)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,598,962, issued on April 7, was assigned to ADEIA SEMICONDUCTOR BONDING TECHNOLOGIES INC. (San Jose, Calif.). "System and method for bonding tr... Read More


US Patent Issued to SAMSUNG ELECTRONICS on April 7 for "Methods of manufacturing semiconductor devices using enhanced patterning techniques" (South Korean Inventor)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,598,963, issued on April 7, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea). "Methods of manufacturing semiconductor devic... Read More


US Patent Issued to Tokyo Electron on April 7 for "Hardmask integration for high aspect ratio applications" (New York Inventors)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,598,964, issued on April 7, was assigned to Tokyo Electron Ltd. (Tokyo). "Hardmask integration for high aspect ratio applications" was invented... Read More


US Patent Issued to YANGTZE MEMORY TECHNOLOGIES on April 7 for "3D NAND memory device with isolation trenches and fabrication method thereof" (Chinese Inventors)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,598,965, issued on April 7, was assigned to YANGTZE MEMORY TECHNOLOGIES Co. LTD. (Wuhan, China). "3D NAND memory device with isolation trenches... Read More


US Patent Issued to IMEC VZW on April 7 for "Method for producing a through semiconductor via connection" (Belgian Inventors)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,598,966, issued on April 7, was assigned to IMEC VZW (Leuven, Belgium). "Method for producing a through semiconductor via connection" was inven... Read More


US Patent Issued to Tencent Technology (Shenzhen) on April 7 for "Through silicon via interconnection structure and method of forming same, and quantum computing device" (Chinese Inventors)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,598,967, issued on April 7, was assigned to Tencent Technology (Shenzhen) Co. Ltd. (Shenzhen, China). "Through silicon via interconnection stru... Read More


US Patent Issued to ASM IP Holding on April 7 for "Method of forming patterned structures" (Belgian, Finnish Inventors)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,598,968, issued on April 7, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Method of forming patterned structures" was invented by... Read More